DocumentCode
2883050
Title
Cylindrical atomospheric plasma source using paralell mhcd and repetitive impulse voltage to the third axial electrode
Author
Maeyama, M. ; Kubota, A. ; Takenaka, M.
Author_Institution
Saitama Univ., Saitama, Japan
fYear
2011
fDate
26-30 June 2011
Firstpage
1
Lastpage
1
Abstract
Summary form only given. The cylindrical parallel MCS plasma source is promising one for an atmospheric plasma. A conventional MCS plasma is composed of the third electrode arranged along the axis and is supplied DC voltage V3 through series resistance R3. The parameter ranges of V3 and R3 are very sensitive to conditions of a gas pressure P, repetitive frequency, and the supply power was limited. In this paper, we proposed the cylindrical atmospheric plasma source using parallel MHCD and repetitive impulse voltage to the third axial electrode. This repetitively impulse voltage make it possible to expand these parameters and enlarge the reduced electric field E/n. The repetitive pulse generator (10 kV and 10 kHz), which is multistage IG and composed of IGBT switches, can adjust output voltage at each pulse with high efficiency. Applying this pulse voltage to the third electrode, we demonstrated proposed cylindrical parallel MCS plasma source. Details of the apparatus configurations and results will be presented.
Keywords
plasma pressure; plasma sources; plasma transport processes; power semiconductor switches; pulse generators; DC voltage; IGBT switches; cylindrical atmospheric plasma source; cylindrical parallel MCS plasma source; frequency 10 kHz; gas pressure condition; parallel MHCD system; repetitive frequency; repetitive impulse voltage analysis; repetitive pulse generator; voltage 10 kV; Electrodes; Plasma sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location
Chicago, IL
ISSN
0730-9244
Print_ISBN
978-1-61284-330-8
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2011.5993176
Filename
5993176
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