Title :
Cylindrical atomospheric plasma source using paralell mhcd and repetitive impulse voltage to the third axial electrode
Author :
Maeyama, M. ; Kubota, A. ; Takenaka, M.
Author_Institution :
Saitama Univ., Saitama, Japan
Abstract :
Summary form only given. The cylindrical parallel MCS plasma source is promising one for an atmospheric plasma. A conventional MCS plasma is composed of the third electrode arranged along the axis and is supplied DC voltage V3 through series resistance R3. The parameter ranges of V3 and R3 are very sensitive to conditions of a gas pressure P, repetitive frequency, and the supply power was limited. In this paper, we proposed the cylindrical atmospheric plasma source using parallel MHCD and repetitive impulse voltage to the third axial electrode. This repetitively impulse voltage make it possible to expand these parameters and enlarge the reduced electric field E/n. The repetitive pulse generator (10 kV and 10 kHz), which is multistage IG and composed of IGBT switches, can adjust output voltage at each pulse with high efficiency. Applying this pulse voltage to the third electrode, we demonstrated proposed cylindrical parallel MCS plasma source. Details of the apparatus configurations and results will be presented.
Keywords :
plasma pressure; plasma sources; plasma transport processes; power semiconductor switches; pulse generators; DC voltage; IGBT switches; cylindrical atmospheric plasma source; cylindrical parallel MCS plasma source; frequency 10 kHz; gas pressure condition; parallel MHCD system; repetitive frequency; repetitive impulse voltage analysis; repetitive pulse generator; voltage 10 kV; Electrodes; Plasma sources;
Conference_Titel :
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location :
Chicago, IL
Print_ISBN :
978-1-61284-330-8
Electronic_ISBN :
0730-9244
DOI :
10.1109/PLASMA.2011.5993176