DocumentCode :
2883070
Title :
Integrated cylindrical plasma source using paralell operated MCS discharges
Author :
Asano, T. ; Kon, A. ; Maeyama, M.
Author_Institution :
Saitama Univ., Saitama, Japan
fYear :
2011
fDate :
26-30 June 2011
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. The plasma sources of atmospheric pressure plasma are studied intensively, as a expansion of application fields. The micro hollow cathode discharge (MHCD) and MHCD sustained (MCS) discharge are useful plasma sources which can produce glow plasmas under an atmospheric pressure, whereas there are the subjects to expand discharge areas because the single discharge region is minute. Nagano, et al. proposed parallel operated cylindrical MCS plasma source, and showed its effectiveness. In this paper, we proposed integrated and multi-phased cylindrical MCS plasma source using distributed conducting material that functions as ballast resistances. A possibility of parallel MCS operation becomes high with increasing axial distance of MHCD electrode due to distortion of electric field. So, multi-phased pulse voltage source to MHCD also becomes the plasma source enable accumulates plasma sources. The proposed plasma source is composed of an axial thin wire electrode and a cylindrical aluminum tube with several MHCD electrodes and a resistive material (2 kΩ.m, 2mm thick) in piles. And, as a result, 16 parallel MCS discharge can be demonstrated at atmospheric pressure and V3= 8.3kV. Details of the apparatus configurations and results will be presented.
Keywords :
aluminium; electrodes; glow discharges; plasma sources; plasma transport processes; Al; atmospheric pressure plasma; axial thin wire electrode; ballast resistance; cylindrical aluminum tube; glow plasmas; integrated cylindrical plasma source; microhollow cathode discharge; multiphased pulse voltage source; parallel operated MCS discharges; pressure 1 atm; resistive material; Discharges; Fault location;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location :
Chicago, IL
ISSN :
0730-9244
Print_ISBN :
978-1-61284-330-8
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2011.5993177
Filename :
5993177
Link To Document :
بازگشت