Title :
System applications and limitations of submicron MOS
Author :
Mack, I. ; Gaensslen, F.
Author_Institution :
Naval Research Laboratory, Washington, DC, USA
Abstract :
MOS technology has progressed to where 1μ design rules can be supported. However, a question arises as to the appropriate effort which sould be applied to submicron MOS technology at this time to achieve the projected 20-30 times increase in device density and concomitant increase in system performance. The process, device and system implications of pursuing submicron MOS technology will be discussed.
Keywords :
Clocks; Educational institutions; Fabrication; Industrial economics; Integrated circuit interconnections; Integrated circuit technology; Lithography; Microcomputers; Packaging; Signal design;
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1985 IEEE International
Conference_Location :
New York, NY, USA
DOI :
10.1109/ISSCC.1985.1156848
