DocumentCode
2883112
Title
Ion emission dynamics in ultrafast laser ablated plasmas
Author
Verhoff, B. ; Polek, M. ; Harilal, S.S. ; Hassanein, A.
Author_Institution
Center for Mater. Under Extreme Environ., Purdue Univ., West Lafayette, IN, USA
fYear
2011
fDate
26-30 June 2011
Firstpage
1
Lastpage
1
Abstract
Summary form only given. There has been intensive interest in the studies of ultrafast laser ablation dynamics due to its wide application in the fields of micromachining, laser surgery, surface smoothing, nanoparticle production etc. Compared to long-pulse nanosecond (ns) laser ablation, the thermal processes are less pronounced in plasmas produced by femtosecond (fs) ultrafast lasers. Ultrafast lasers are better suited for micromachining, pulsed laser deposition and various other applications. Ultra-intense laser produced plasmas can also be used for producing collimated proton, electron and neutron beams. Moreover, the laser plasmas provide intense ion beams with a high charge state, the so called laser ion source (LIS). However, the lack of control of the ion pulse from laser-produced plasmas limits its applications and further studies are necessary to improve basic understanding of ion emission dynamics from laser-produced plasmas. We investigated the dynamics of ion emission from ultrafast laser ablated plasmas in vacuum from metal targets. The angular features of ion emission features are studied for ultrafast laser ablation and compared with ion emission features of long-pulse ns laser-produced plasmas. For producing ultrafast laser-plasmas, metal targets are ablated in vacuum using 800 nm, 40 fs (FWHM) pulses from a Ti: Sapphire amplifier with a laser intensity of ~1015 Wcm-2. The kinetic energy distribution of emitted ions is characterized using a Faraday cup. The angular distribution of ion emission is characterized by positioning Faraday cups at various angles with respect to target normal. For producing long-pulse laser plasmas, 1064 nm 6 ns (FWHM) radiation from a Nd:YAG laser is used with a laser intensity of ~1010 W cm-2. The differences in ions kinetic energy as well as ions angular distribution in plasmas produced by ultra-short and long-pulse laser produced plasmas are presented and discussed.
Keywords
ion sources; laser ablation; plasma production by laser; plasma sources; plasma transport processes; Faraday cup; femtosecond ultrafast laser; high charge state; ion angular distribution; ion emission angular distribution; ion emission dynamics; ion kinetic energy distribution; kinetic energy distribution; laser intensity analysis; laser ion source; laser surgery field; long-pulse nanosecond laser ablation; long-pulse nanosecond laser-produced plasma; micromachining field; pulsed laser deposition process; surface smoothing field; thermal process; time 40 fs; time 6 ns; ultrafast laser ablated plasma; ultraintense laser produced plasma analysis; wavelength 1064 nm; wavelength 800 nm; Laser applications; Plasmas;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location
Chicago, IL
ISSN
0730-9244
Print_ISBN
978-1-61284-330-8
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2011.5993181
Filename
5993181
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