Title :
A 30ns 256K full CMOS SRAM
Author :
Okazaki, Naonobu ; Miyaji, F. ; Kobayashi, Kaoru ; Harada, Y. ; Aoyama, J. ; Shimada, Toshikazu
Author_Institution :
Sony Semiconductor Group, Kanagawa, Japan
Abstract :
This paper will cover a 32K×8 full CMOS SRAM with a divided word line that has been fabricated in single-poly, double-metal, P-well CMOS, Address access time is 30ns. Standby power dissipation is 500mW. The CMO5 memory cell using 6 transistors, designed in 1.0μm layout rules, measures 10.6μm

m.
Keywords :
Artificial intelligence; CMOS technology; Driver circuits; Isolation technology; MOSFETs; Paper technology; Power dissipation; Random access memory; Read-write memory; Very large scale integration;
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1986 IEEE International
Conference_Location :
Anaheim, CA, USA
DOI :
10.1109/ISSCC.1986.1156880