DocumentCode :
2883733
Title :
A new RF capacitance method to extract the effective channel length of MOSFET´s using S-parameters
Author :
Lee, Seonghearn
Author_Institution :
Dept. of Electron. Eng., Hankuk Univ. of Foreign Studies, Yongin, South Korea
fYear :
2000
fDate :
2000
Firstpage :
56
Lastpage :
59
Abstract :
A simple and accurate extraction of the effective channel length is carried out by utilizing the slope information of the the intrinsic gate-to-channel capacitance versus the mask gate length of ultra short-channel devices. The measurement setup where the gate is connected to a RF signal is used to remove the discrepancy problem between conventional I-V and C-V methods. In order to increase the measurement accuracy, the intrinsic gate-to-channel capacitance data are determined by calibrating S-parameter sets measured at GHz using zero-bias data, instead of low-frequency C-V measurements. Contrary to the conventional C-V method, this new RF C-V method results in much smaller deviation from the I-V method
Keywords :
MOSFET; S-parameters; capacitance; semiconductor device measurement; MOSFET; RF capacitance measurement; S-parameters; effective channel length; parameter extraction; ultra-short channel device; Capacitance measurement; Capacitance-voltage characteristics; Electrical resistance measurement; Frequency measurement; Length measurement; MOSFET circuits; Parasitic capacitance; Radio frequency; Scattering parameters; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2000. Proceedings. 2000 IEEE Hong Kong
Conference_Location :
Hong Kong
Print_ISBN :
0-7803-6304-3
Type :
conf
DOI :
10.1109/HKEDM.2000.904215
Filename :
904215
Link To Document :
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