DocumentCode :
2883784
Title :
Antibacterial efficacy of nonthermal atmospheric pressure plasma against
Author :
Aktan, T. ; Oksuz, L. ; Guldas, H.E. ; Kaya, B. Ureyen ; Kececi, A.D. ; Cetin, E. Sesli ; Ozturk, T.
Author_Institution :
Dept. of Phys., Suleyman Demirel Univ., Isparta, Turkey
fYear :
2011
fDate :
26-30 June 2011
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. In this work, killer effects of nonthermal atmospheric pressure plasma on Candida albicans known as resistant microorganisms in the obdurate root canals were investigated. We produced atmospheric pressure plasma jet with 99% helium flow and 1% oxygen flow. Sabouraud dextrose agar (SDA) plates were inoculated with 0.2 mL broth culture of Candida albicans ATCC 254625 at three different concentrations of 0.5, 1 and 2 McFarland. Petri dishes and the pencil was also fixed at 10 mm. Plasma application was performed for 30s, 60s, 3m and 5m on each plate. For quantitative evaluation, 1ml broth culture of Candida albicans at concentration of 0.5 McFarland was prepared in 6 sterile Eppendorf tubes. The discharge was applied for 30s, 60s, 3m, 5m and 10 min on each tube. 13×20 mm area of microbial killing was observed with longer plasma exposure time (up to 5 min). The non thermal plasma can efficiently kill C. albicans in all application times. It seems to be harmless according to current root canal disinfectants because of its low temperature. Optical emission spectrum and current-voltage characteristics were given.
Keywords :
antibacterial activity; cellular effects of radiation; discharges (electric); microorganisms; plasma applications; plasma diagnostics; 0.5 McFarland; ATCC 254625; Candida albicans; Eppendorf tubes; antibacterial efficacy; current-voltage characteristics; discharge; distance 10 mm; helium flow; microorganisms; nonthermal atmospheric pressure plasma; obdurate root canals; optical emission spectrum; oxygen flow; plasma exposure time; plasma jet; sabouraud dextrose agar plates; size 13 mm; size 20 mm; time 0.5 min to 10 min; Resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location :
Chicago, IL
ISSN :
0730-9244
Print_ISBN :
978-1-61284-330-8
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2011.5993232
Filename :
5993232
Link To Document :
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