DocumentCode :
2883927
Title :
Determination of the rocking curve and reflection efficiency of a SiO2 crystal imager using Zr, Nb, Mo AND Ag Kα x-rays
Author :
Schiebel, P. ; Storm, M. ; Akli, K. ; Zhong, Z.
Author_Institution :
Ohio State Univ., Columbus, OH, USA
fYear :
2011
fDate :
26-30 June 2011
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. The diffraction and reflection of x-rays by crystalline structures is important in diagnosing the properties of hot, dense, strongly emitting plasmas such as those that are generated by intense laser light. The rocking curve and reflection efficiency of a SiO2 crystal has been measured for four different x-ray energies, E = 15.690, 16.521, 17.374, and 22.1629 keV corresponding to the Kα lines of Zr, Nb, Mo and Ag, respectively. The crystal is Quartz with Miller indices of [2354]. It is used for x-ray imaging and has a spherically curved surface with a focal length of 25 cm. The x-rays, which were provided by the National Synchrotron Light Source at Brookhaven National Laboratory, were collimated and polarized in the horizontal plane with an energy bandwidth ΔE/E ~ 10-4. The x-ray flux was measured using an ion chamber. The crystal was mounted in a goniometer and swept in the vertical through an angle of 4° in 0.025° steps centered on the expected reflection direction. The reflected x-rays were detected using imaging plates. The rocking curves and reflectivity data will be presented.
Keywords :
X-ray reflection; crystal structure; goniometers; ionisation chambers; plasma diagnostics; plasma light propagation; silicon compounds; Miller indices; SiO2; crystal imager; crystalline structure; electron volt energy 15.690 keV; electron volt energy 16.521 keV; electron volt energy 17.374 keV; electron volt energy 22.1629 keV; energy bandwidth; goniometer; ion chamber; quartz; reflection efficiency; reflectivity; strongly emitting plasma; x-ray diffraction; x-ray flux; x-ray imaging; x-ray reflection;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location :
Chicago, IL
ISSN :
0730-9244
Print_ISBN :
978-1-61284-330-8
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2011.5993238
Filename :
5993238
Link To Document :
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