DocumentCode :
2884453
Title :
Temperature dependence of avalanche multiplication in spiked electric fields
Author :
van den Berg, M.R. ; Nanver, L.K. ; Slotboom, J.W.
Author_Institution :
DIMES-ECTM, Delft Univ. of Technol., Netherlands
fYear :
2000
fDate :
10-13 Dec. 2000
Firstpage :
79
Lastpage :
82
Abstract :
The temperature dependence of avalanche multiplication in spiked electric fields in silicon is investigated for charge carrier transport across highly doped pn-junctions and across thin gate oxides. Impact ionization events with near-zero to positive temperature coefficients are experimentally observed. A model is proposed that explains the positive temperature coefficient in terms of increased effective electric field due to the decrease of the energy relaxation length for increasing temperature.
Keywords :
avalanche breakdown; elemental semiconductors; impact ionisation; p-n junctions; silicon; Si; avalanche multiplication; charge carrier transport; electric field spike; energy relaxation length; gate oxide; impact ionization; p-n junction; silicon; temperature dependence; Bipolar transistors; Charge carriers; Current measurement; Doping profiles; Electrons; Impact ionization; MOSFETs; Silicon; Temperature dependence; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2000. IEDM '00. Technical Digest. International
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-6438-4
Type :
conf
DOI :
10.1109/IEDM.2000.904263
Filename :
904263
Link To Document :
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