DocumentCode :
2885046
Title :
Large-area magnetic metamaterials for photonics by interference lithography
Author :
Feth, N. ; Enkrich, C. ; Meisel, D.C. ; Wegener, M. ; Soukoulis, C.M. ; Linden, S.
Author_Institution :
Inst. fur Angewandte Phys., Univ. Karlsruhe (TH), Karlsruhe
fYear :
2006
fDate :
21-26 May 2006
Firstpage :
1
Lastpage :
2
Abstract :
We present a novel approach for fabricating large-area (16 times 22 mm2) magnetic metamaterials with a negative magnetic permeability at telecom wavelengths. Our approach brings the complexity of fabricating magnetic layers down to that of dielectric layers.
Keywords :
light interference; magnetic materials; metamaterials; dielectric layers; interference lithography; large area magnetic metamaterials; magnetic layers; negative magnetic permeability; photonics; Interference; Laser beams; Lithography; Magnetic materials; Magnetic resonance; Magnetic separation; Metamaterials; Optical resonators; Photonics; Resists; (160.4760) Optical properties; (260.5740) Resonance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location :
Long Beach, CA
Print_ISBN :
978-1-55752-813-1
Electronic_ISBN :
978-1-55752-813-1
Type :
conf
DOI :
10.1109/CLEO.2006.4629063
Filename :
4629063
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2885046
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