DocumentCode :
2885416
Title :
Experimental and numerical analysis of the quantum yield [MOSFETs]
Author :
Ielmini, D. ; Spinelli, A.S. ; Lacaita, A.L. ; DiMaria, D.J. ; Ghidini, G.
Author_Institution :
Dipartimento di Elettronica, Politecnico di Milano, Italy
fYear :
2000
fDate :
10-13 Dec. 2000
Firstpage :
331
Lastpage :
334
Abstract :
In this work it is shown that the quantum yield (QY) measurement cannot be used to extract the energy loss of the electrons responsible for the stress-induced leakage current (SILC). Time-relaxation experiments show that good correlation exists between the QY and the high-energy oxide states, while the SILC and the QY are not correlated. We suggest that the SILC is given by deep levels with a low ionization rate, while the QY is due to a small fraction of carriers tunneling through high-energy states with a high ionization efficiency. The conclusion is supported by numerical simulations.
Keywords :
MOSFET; deep levels; energy loss of particles; impact ionisation; insulating thin films; leakage currents; semiconductor device models; tunnelling; MOSFETs; SILC; deep levels; energy loss; high-energy oxide states; high-energy states; ionization efficiency; ionization rate; quantum yield; stress-induced leakage current; time-relaxation experiments; tunneling; Current measurement; Electrons; Energy loss; Energy measurement; Ionization; Leakage current; Loss measurement; MOSFETs; Numerical analysis; Stress measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2000. IEDM '00. Technical Digest. International
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-6438-4
Type :
conf
DOI :
10.1109/IEDM.2000.904323
Filename :
904323
Link To Document :
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