• DocumentCode
    2885792
  • Title

    Microwave plasma jet system development at atmospheric pressure using A 2.45 GHz GaN HEMT devices

  • Author

    Jae Duk Kim ; Young Ho Na ; Young June Hong ; Han Sup Uhm ; Jin Joo choi ; Eun Ha Choi

  • Author_Institution
    Dept. of Wireless Commun. Eng., Kwangwoon Univ., Seoul, South Korea
  • fYear
    2011
  • fDate
    26-30 June 2011
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. Microplasmas at atmospheric pressure have been widely used in many applications such as sterilization of medical instruments, high-precision surgery, cells treatment and deactivation of bacteria and viruses. We report a 2.45 GHz microwave-excited atmospheric-pressure plasma jet system which is consisted of a 2.45-GHz, GaN HEMT oscillator, a circulator, a three-stub tuner, and microwave plasma jet source. Advanced Design System and 3D High Frequency Structure Simulation codes are used to design oscillator and microwave plasma jet source. The operating power and frequency of this device are in 5-25 W and 2.45 GHz, respectively. The plasma jet length is estimated to be ~16 mm at 20 W. The electron temperature are measured to be Te=1.2 ~1.9 eV by using the collision radiative modes based on the argon 4p metastable lines.
  • Keywords
    III-V semiconductors; gallium compounds; high electron mobility transistors; plasma applications; plasma collision processes; plasma diagnostics; plasma jets; plasma simulation; plasma sources; plasma temperature; wide band gap semiconductors; 3D high frequency structure simulation codes; GaN; HEMT oscillator; argon 4p metastable lines; collision radiative modes; electron temperature; frequency 2.45 GHz; high-precision surgery; medical instruments; microwave plasma jet system; plasma sources; power 5 W to 25 W; pressure 1 atm; sterilization; Gallium nitride; HEMTs; Microwave devices; Microwave oscillators; Plasmas;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
  • Conference_Location
    Chicago, IL
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-61284-330-8
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2011.5993386
  • Filename
    5993386