DocumentCode :
2885866
Title :
Microchannel plasma reactor for gaseous remediation and destruction
Author :
Masters, B.C. ; Garvin, T. ; Marsh, C.P.
Author_Institution :
Constr. Eng. Res. Lab., US Army Corps of Eng., Champaign, IL, USA
fYear :
2011
fDate :
26-30 June 2011
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. The ability to generate steady atmospheric pressure microdischarges has become feasible as micro-manufacturing technologies have continued to improve. At present, there are a small number of developing technologies surrounding microplasmas, perhaps most prominently as a low-profile light source. Other potential applications of such research include the cost-effective remediation of various gaseous waste streams (e.g., CO2), and the reformation of hydrogen gas from common sources such as methane (CH4) and ammonia (NH3). The reaction kinetics in a microplasma channel can be controlled to some extent through electric field strength and frequency, reactant gas flow rate, and the geometry of the channel itself. The microchannel for this work is fabricated on a MACOR™ ceramic surface using micro-machining technology available at the Univ. of Illinois at Urbana Champaignt, which has the advantage of being easily machinable, unlike alumina, while still bearing the high dielectric constant required. Microchannels for this device are 80 micrometers deep and 150 micrometers wide, and range from simple straight channels to highly complex shapes and paths. The recessed microchannels are covered by a glass microscope slide cover with a thin indium tin oxide (ITO) coating, allowing voltage to be put across the channel while simultaneously permitting spectroscopic measurements. In the experimental setup for this work, power is applied across the microchannel using a variable autotransformer and a high-voltage transformer. The latter is capable of producing ~5.7 kVpp at 20 kHz. Residence time can be varied by changing intake gas flow rate, and also by changing the electric field strengths within the channel. Positive pressure from a feedstock gas is applied into a mass flow controller that feeds into the microchannel; the exhaust of the microchannel is evacuated using a mechanical vacuum pump. Three iterations of rea- tors were built and tested to iteratively improve on design. Initial experiments consisted of inert gases followed by more complex diatomic and polyatomic gases. Plasma properties are measured by observing the intensity of its light with a spectrometer. Plasma properties of primary interest in this experiment are: species residence time, electron density, electron temperature, ion temperature, and ionization fraction. These quantities can be determined through the use of spectroscopic line ratio measurements in addition to some simple chemical reaction modeling.
Keywords :
ammonia; autotransformers; coatings; discharges (electric); ionisation; light sources; micromachining; organic compounds; plasma chemistry; plasma density; plasma diagnostics; plasma dielectric properties; plasma flow; plasma materials processing; plasma pressure; plasma sources; plasma temperature; surface treatment; MACOR ceramic surface; NH3; chemical reaction model; complex diatomic gases; complex polyatomic gases; electric field strength; electron density; electron temperature; feedstock gas analysis; frequency 20 kHz; gaseous destruction process; gaseous remediation process; gaseous waste streams; high dielectric constant; high-voltage transformer; hydrogen gas reformation; ion temperature; ionization fraction analysis; iterative method; low-profile light source; mass flow control; mechanical vacuum pump; methane; microchannel plasma reactor; micromachining technology; micromanufacturing technology; microplasma channel geometry; microplasma channel reaction kinetics; plasma properties; reactant gas flow rate; residence time; size 150 mum; spectroscopic line ratio measurement; spectroscopic measurement method; steady atmospheric pressure microdischarge; thin indium tin oxide coating; variable autotransformer; Glass; Inductors; Microchannel; Plasmas; Pumps;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location :
Chicago, IL
ISSN :
0730-9244
Print_ISBN :
978-1-61284-330-8
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2011.5993391
Filename :
5993391
Link To Document :
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