• DocumentCode
    2885912
  • Title

    Plasma engineering of gases in micro ion Atomic Clocks

  • Author

    Statom, T.K.

  • Author_Institution
    Sandia Nat. Labs., Albuquerque, NM, USA
  • fYear
    2011
  • fDate
    26-30 June 2011
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. Atomic Clocks are quantum devices; when ions are used they also become plasma devices. This paper investigates the ions that can be produced from the gas available in a RF linear Paul quadrupole trap used for an Yb ion frequency standard. The gas issues in plasma science and engineering investigated include dimensionless stability parameters from Mathieu´s equation considering the clock ion, buffer gas ion and background gas ions. With the buffer gas having the highest partial pressure, the potential for a DC gas discharge is discussed. The coupling parameter is determined along with the potential depth and ion charge density for the ions previously mentioned. From these parameters it is determined that in this case the plasma is characterized as a weakly coupled nonneutral cold ion plasma gas. Using electron impact ionization and expected partial pressures, the reaction rates for ion production are also determined in order to compare how the different ions would fill up the trap. Considering the plasma characterization, ion particle traces for the configuration are determined and a comparison of analytical stability and numerical simulation stability is presented. The paper concludes with a discussion on the implications of the results on plasma engineering design for micro ion atomic clocks.
  • Keywords
    atomic clocks; discharges (electric); electron impact ionisation; plasma chemistry; plasma collision processes; plasma devices; plasma instability; plasma pressure; plasma simulation; plasma transport processes; ytterbium; DC gas discharge potential; Mathieu equation; RF linear Paul quadrupole trap; Yb; Yb ion frequency analysis; background gas ion analysis; buffer gas ion analysis; coupled nonneutral cold ion plasma gas; coupling parameter; dimensionless stability parameter; electron impact ionization; ion charge density; ion particle trace configuration; microion atomic clocks; numerical simulation stability; partial pressure analysis; plasma characterization; plasma device; plasma engineering; potential depth analysis; quantum device; Atomic clocks; Plasmas;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
  • Conference_Location
    Chicago, IL
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-61284-330-8
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2011.5993395
  • Filename
    5993395