DocumentCode
2886040
Title
A high-Q tunable micromechanical capacitor with movable dielectric for RF applications
Author
Jun-Bo Yoon ; Nguyen, C.T.-C.
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
fYear
2000
fDate
10-13 Dec. 2000
Firstpage
489
Lastpage
492
Abstract
A high-Q, tunable, micromechanical capacitor has been realized using an IC-compatible, electroplated-metal surface micromachining technology and demonstrated with quality (Q-) factors in excess of 290-the highest reported to date for on-chip tunable capacitors at frequencies near 1 GHz. The key feature in this design that makes possible such high on-chip Q is the method for capacitive tuning, which in this design is based on moving the dielectric between the capacitor plates, rather than moving the plates themselves, as done in previous designs. One version of this design achieves a measured Q of 291 at 1 GHz (C=1.21 pF) with a tuning range of 7.7% over 10 V of control voltage, and an expected self-resonant frequency (SRF) of 19 GHz. In another design, with a wider tuning range of 40% over 10 V, a Q of 218 is achieved at 1 GHz (C=1.14 pF).
Keywords
Q-factor; capacitors; micromachining; micromechanical devices; tuning; 1 GHz; 1.14 pF; 1.21 pF; 19 GHz; RF applications; electroplated metal surface micromachining technology; micromechanical capacitor; movable dielectric; quality factor; self-resonant frequency; tuning range; Capacitors; Dielectric devices; Dielectric substrates; Micromechanical devices; Radio frequency; Semiconductor diodes; Structural beams; Tuning; Voltage; Voltage-controlled oscillators;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 2000. IEDM '00. Technical Digest. International
Conference_Location
San Francisco, CA, USA
Print_ISBN
0-7803-6438-4
Type
conf
DOI
10.1109/IEDM.2000.904362
Filename
904362
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