Title :
Electrical Measurement of On-Mask Mismatch Resistor Structures
Author :
Smith, S. ; Tsiamis, A. ; McCallum, M. ; Hourd, A.C. ; Stevenson, J.T.M. ; Walton, A.J.
Author_Institution :
Univ. of Edinburgh, Edinburgh
Abstract :
This paper describes the design and measurement of electrically measured test structures for the characterisation of dimensional mismatch in an advanced photomask making process. Test structures consisting of pairs of Kelvin connected bridge resistors have been fabricated on a chrome-on-quartz photomask plate. These have been electrically measured on-mask and the results used to obtain information about dimensional mismatch in the mask making process.
Keywords :
bridge circuits; electric resistance measurement; masks; resistors; test equipment; Kelvin connected bridge resistors; chrome-on-quartz photomask plate; dimensional mismatch characterisation; electrical measurement; electrically measured test structures; on-mask mismatch resistor structures; photomask making process; Bridges; Chromium; Current measurement; Electric variables measurement; Electrical resistance measurement; Electronic equipment testing; Kelvin; Lithography; Microelectronics; Resistors;
Conference_Titel :
Microelectronic Test Structures, 2007. ICMTS '07. IEEE International Conference on
Conference_Location :
Tokyo
Print_ISBN :
1-4244-0781-8
Electronic_ISBN :
1-4244-0781-8
DOI :
10.1109/ICMTS.2007.374445
