A Systematic Approach to Accurate Evaluation of CD-Metrology Tools

Author

Orji, Ndubuisi G. ; Bunday, Benjamin D. ; Dixson, Ronald G. ; Allgair, John A.

Author_Institution

Nat. Inst. of Stand. & Technol., Gaithersburg

fYear

2007

fDate

19-22 March 2007

Firstpage

9

Lastpage

13

Abstract

We present a procedure for evaluating the accuracy and performance of critical dimension (CD) metrology tools used in monitoring the semiconductor manufacturing process. Our method involves a reference measurement instrument and SI traceable reference material to evaluate the accuracy and resolution of CD metrology tools. The achievable accuracy and intrinsic linearity of the tools under test are evaluated with respect to the reference system.

Keywords

integrated circuit manufacture; measurement systems; measurement uncertainty; SI traceable reference material; accuracy evaluation; atomic force microscope; critical dimension metrology tools; intrinsic linearity; performance evaluation; reference measurement instrument; scanning electron microscope; semiconductor manufacturing process monitoring; tools resolution; Atomic force microscopy; Instruments; Manufacturing processes; Metrology; Microelectronics; Optical scattering; Radar measurements; Scanning electron microscopy; Semiconductor device manufacture; System testing; Accuracy; Atomic force microscope; Critical dimension; Scanning electron microscope; Uncertainty;

fLanguage

English

Publisher

ieee

Conference_Titel

Microelectronic Test Structures, 2007. ICMTS '07. IEEE International Conference on

Conference_Location

Tokyo

Print_ISBN

1-4244-0781-8

Electronic_ISBN

1-4244-0781-8

Type

conf

DOI

10.1109/ICMTS.2007.374446

Filename

4252396