• DocumentCode
    2886560
  • Title

    Room-temperature memory operation of AlGaAs/GaAs high electron mobility transistors with InAs quantum dots embedded in the channel

  • Author

    Jae-Eung Oh ; Jong-Wook Kim

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Hanyang Univ., Ansan, South Korea
  • fYear
    2000
  • fDate
    10-13 Dec. 2000
  • Firstpage
    601
  • Lastpage
    603
  • Abstract
    We have investigated the room-temperature memory effect of AlGaAs/GaAs high electron mobility transistors (HEMTs) containing InAs quantum dots in the channel layer. Unlike the previously reported results where InAs quantum dots were inserted into the barrier layer, which has an analogy to flash memory, the channel potential in the proposed structure is directly modulated by the charging state of quantum dots. Although the shift of the threshold gate voltage volatilizes with the time after the memory writing operation, the shift is retained even after 1 hour at room temperature.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor quantum dots; semiconductor storage; AlGaAs-GaAs-InAs; channel potential; charging state; high electron mobility transistors; memory writing operation; quantum dots; room-temperature memory effect; threshold gate voltage; Current measurement; Gallium arsenide; HEMTs; Hysteresis; MODFETs; Quantum computing; Quantum dot lasers; Quantum dots; Threshold voltage; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2000. IEDM '00. Technical Digest. International
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    0-7803-6438-4
  • Type

    conf

  • DOI
    10.1109/IEDM.2000.904392
  • Filename
    904392