DocumentCode :
2886560
Title :
Room-temperature memory operation of AlGaAs/GaAs high electron mobility transistors with InAs quantum dots embedded in the channel
Author :
Jae-Eung Oh ; Jong-Wook Kim
Author_Institution :
Sch. of Electr. & Comput. Eng., Hanyang Univ., Ansan, South Korea
fYear :
2000
fDate :
10-13 Dec. 2000
Firstpage :
601
Lastpage :
603
Abstract :
We have investigated the room-temperature memory effect of AlGaAs/GaAs high electron mobility transistors (HEMTs) containing InAs quantum dots in the channel layer. Unlike the previously reported results where InAs quantum dots were inserted into the barrier layer, which has an analogy to flash memory, the channel potential in the proposed structure is directly modulated by the charging state of quantum dots. Although the shift of the threshold gate voltage volatilizes with the time after the memory writing operation, the shift is retained even after 1 hour at room temperature.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor quantum dots; semiconductor storage; AlGaAs-GaAs-InAs; channel potential; charging state; high electron mobility transistors; memory writing operation; quantum dots; room-temperature memory effect; threshold gate voltage; Current measurement; Gallium arsenide; HEMTs; Hysteresis; MODFETs; Quantum computing; Quantum dot lasers; Quantum dots; Threshold voltage; Writing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2000. IEDM '00. Technical Digest. International
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-6438-4
Type :
conf
DOI :
10.1109/IEDM.2000.904392
Filename :
904392
Link To Document :
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