DocumentCode
2886560
Title
Room-temperature memory operation of AlGaAs/GaAs high electron mobility transistors with InAs quantum dots embedded in the channel
Author
Jae-Eung Oh ; Jong-Wook Kim
Author_Institution
Sch. of Electr. & Comput. Eng., Hanyang Univ., Ansan, South Korea
fYear
2000
fDate
10-13 Dec. 2000
Firstpage
601
Lastpage
603
Abstract
We have investigated the room-temperature memory effect of AlGaAs/GaAs high electron mobility transistors (HEMTs) containing InAs quantum dots in the channel layer. Unlike the previously reported results where InAs quantum dots were inserted into the barrier layer, which has an analogy to flash memory, the channel potential in the proposed structure is directly modulated by the charging state of quantum dots. Although the shift of the threshold gate voltage volatilizes with the time after the memory writing operation, the shift is retained even after 1 hour at room temperature.
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor quantum dots; semiconductor storage; AlGaAs-GaAs-InAs; channel potential; charging state; high electron mobility transistors; memory writing operation; quantum dots; room-temperature memory effect; threshold gate voltage; Current measurement; Gallium arsenide; HEMTs; Hysteresis; MODFETs; Quantum computing; Quantum dot lasers; Quantum dots; Threshold voltage; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 2000. IEDM '00. Technical Digest. International
Conference_Location
San Francisco, CA, USA
Print_ISBN
0-7803-6438-4
Type
conf
DOI
10.1109/IEDM.2000.904392
Filename
904392
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