DocumentCode
2886688
Title
Cold atom deposition for nanoscale structuring of surfaces
Author
Tantussi, F. ; Camposeo, A. ; Fuso, F. ; Allegrini, M. ; Arimondo, E.
Author_Institution
Dipartimento di Fisica, Pisa Univ., Italy
fYear
2005
fDate
12-17 June 2005
Firstpage
248
Abstract
The work aims to develop an atom lithography apparatus by exploiting cold atoms, differently from conventional implementations where thermal atomic sources are used. The cold atomic beam of the apparatus is produced continuously out of a pyramidal magnetooptical trap (MOT) for cesium atoms, a specific configuration of mirrors mounted as the inner part of a hollow pyramid, with a small apical aperture.
Keywords
atom optics; atomic beams; caesium; laser cooling; magneto-optical effects; nanolithography; Cs; atom lithography; atomic beam; cesium atoms; cold atom deposition; magnetooptical trap; nanoscale surface structuring; Atom lasers; Atom optics; Atomic beams; Atomic layer deposition; Laser beams; Laser transitions; Lithography; Optical sensors; Resists; Resonance;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics Conference, 2005. EQEC '05. European
Print_ISBN
0-7803-8973-5
Type
conf
DOI
10.1109/EQEC.2005.1567414
Filename
1567414
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