• DocumentCode
    2887127
  • Title

    Methodology for performing RF reliability experiments on a generic test structure

  • Author

    Sasse, Guido T. ; De Vries, Rein J. ; Schmitz, Jurriaan

  • Author_Institution
    Univ. of Twente, Enschede
  • fYear
    2007
  • fDate
    19-22 March 2007
  • Firstpage
    177
  • Lastpage
    182
  • Abstract
    This paper discusses a new technique developed for generating well defined RF large voltage swing signals for on wafer experiments. This technique can be employed for performing a broad range of different RF reliability experiments on one generic test structure. The frequency dependence of a gate-oxide wear out stress was investigated using this methodology for frequencies of up to 1 GHz.
  • Keywords
    MIS devices; semiconductor device measurement; semiconductor device reliability; semiconductor device testing; stress analysis; MOS device degradation; RF large voltage swing signal generation; RF reliability experiments; frequency dependency; gate-oxide wear out stress; generic test structure; on wafer experiments; Circuits; Degradation; Impedance; Performance evaluation; RF signals; Radio frequency; Signal generators; Stress; Testing; Voltage; RF; Reliability; large signal; oxide degradation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronic Test Structures, 2007. ICMTS '07. IEEE International Conference on
  • Conference_Location
    Tokyo
  • Print_ISBN
    1-4244-0781-8
  • Electronic_ISBN
    1-4244-0781-8
  • Type

    conf

  • DOI
    10.1109/ICMTS.2007.374478
  • Filename
    4252428