Title :
A Novel RF-WAT Test Structure for Advanced Process Monitoring in SOC Applications
Author :
Chen, David C. ; Lee, Ryan ; Liu, Y.C. ; Tang, Mao Chyuan ; Chiang, Gavin ; Kuo, Annie ; Yeh, C.S. ; Chien, S.C. ; Sun, S.W.
Author_Institution :
United Microelectron. Corp., Hsinchu
Abstract :
This paper presents a novel radio frequency (RF) structure for wafer acceptance test (WAT) to monitor RF device in the scribe line area with 60 mum or smaller in width. WAT including RF items for statistical analysis, yield enhancement and function verification is crucial for the success of system on chip (SoC). Conventional south-north GSG (C-GSG) structure, scribe line GSG (S-GSG) structure, which means a 2-port GSG in a row, GSGSG, and GSSG structure are used together with the proposed RF-WAT structure for silicon verification. Excellent mapping results of extensive application on RF-CV in 65 nm ultra-thin oxide CMOS devices at 12-inch wafer are also demonstrated.
Keywords :
CMOS integrated circuits; integrated circuit testing; integrated circuit yield; process monitoring; radiofrequency integrated circuits; statistical analysis; system-on-chip; SOC applications; function verification; process monitoring; radio frequency structure; silicon verification; size 12 inch; statistical analysis; system-on-chip; ultrathin oxide CMOS devices; wafer acceptance test; yield enhancement; Circuit testing; Control systems; Integrated circuit measurements; Integrated circuit technology; Microelectronics; Monitoring; Probes; Radio frequency; Silicon; System testing;
Conference_Titel :
Microelectronic Test Structures, 2007. ICMTS '07. IEEE International Conference on
Conference_Location :
Tokyo
Print_ISBN :
1-4244-0781-8
Electronic_ISBN :
1-4244-0781-8
DOI :
10.1109/ICMTS.2007.374492