DocumentCode
2887418
Title
A Novel RF-WAT Test Structure for Advanced Process Monitoring in SOC Applications
Author
Chen, David C. ; Lee, Ryan ; Liu, Y.C. ; Tang, Mao Chyuan ; Chiang, Gavin ; Kuo, Annie ; Yeh, C.S. ; Chien, S.C. ; Sun, S.W.
Author_Institution
United Microelectron. Corp., Hsinchu
fYear
2007
fDate
19-22 March 2007
Firstpage
243
Lastpage
247
Abstract
This paper presents a novel radio frequency (RF) structure for wafer acceptance test (WAT) to monitor RF device in the scribe line area with 60 mum or smaller in width. WAT including RF items for statistical analysis, yield enhancement and function verification is crucial for the success of system on chip (SoC). Conventional south-north GSG (C-GSG) structure, scribe line GSG (S-GSG) structure, which means a 2-port GSG in a row, GSGSG, and GSSG structure are used together with the proposed RF-WAT structure for silicon verification. Excellent mapping results of extensive application on RF-CV in 65 nm ultra-thin oxide CMOS devices at 12-inch wafer are also demonstrated.
Keywords
CMOS integrated circuits; integrated circuit testing; integrated circuit yield; process monitoring; radiofrequency integrated circuits; statistical analysis; system-on-chip; SOC applications; function verification; process monitoring; radio frequency structure; silicon verification; size 12 inch; statistical analysis; system-on-chip; ultrathin oxide CMOS devices; wafer acceptance test; yield enhancement; Circuit testing; Control systems; Integrated circuit measurements; Integrated circuit technology; Microelectronics; Monitoring; Probes; Radio frequency; Silicon; System testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronic Test Structures, 2007. ICMTS '07. IEEE International Conference on
Conference_Location
Tokyo
Print_ISBN
1-4244-0781-8
Electronic_ISBN
1-4244-0781-8
Type
conf
DOI
10.1109/ICMTS.2007.374492
Filename
4252442
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