• DocumentCode
    2887545
  • Title

    Impact of gate-induced drain leakage current on the tail distribution of DRAM data retention time

  • Author

    Saino, K. ; Horiba, S. ; Uchiyama, S. ; Takaishi, Y. ; Takenaka, M. ; Uchida, T. ; Takada, Y. ; Koyama, K. ; Miyake, H. ; Hu, C.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
  • fYear
    2000
  • fDate
    10-13 Dec. 2000
  • Firstpage
    837
  • Lastpage
    840
  • Abstract
    In this paper we propose a new model for leakage mechanism in tail-mode bits of DRAM data retention characteristics. For main-mode bits, leakage current can be attributed to junction thermal-generation leakage current. For tail-mode bits, it is found for the first time that Gate-Induced Drain Leakage (GIDL) current has a dominant impact. The root cause is electric field enhancement caused by metal precipitates located at the gate-drain overlap region.
  • Keywords
    DRAM chips; leakage currents; precipitation; DRAM; data retention time; electric field; gate-induced drain leakage current; metal precipitates; tail distribution; tail-mode bits; Capacitors; Current measurement; Dielectric substrates; Leakage current; National electric code; Probability distribution; Random access memory; Testing; Vehicles; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2000. IEDM '00. Technical Digest. International
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    0-7803-6438-4
  • Type

    conf

  • DOI
    10.1109/IEDM.2000.904447
  • Filename
    904447