DocumentCode :
2888319
Title :
Modified Euler path rule for MOS layout minimization
Author :
Cheng, Shun-Wen ; Cneng, Kou-Hsing
Author_Institution :
TKU, Taipei
Volume :
1
fYear :
2004
fDate :
6-9 Dec. 2004
Firstpage :
541
Abstract :
Get minimal layout areas without diffusion breaks and then keep good electrical characteristics are useful for IC design. This work changes the viewpoint of constructing Euler path on IC circuit and puts some basic layout ideas into systematic approach. The study provides another way to constructing the Euler path on MOS circuits. The proposed method produces a more compact layout with less parasitic capacitance and contact
Keywords :
CMOS digital integrated circuits; VLSI; circuit layout CAD; integrated circuit layout; minimisation; CMOS; IC circuit; IC design; MOS layout minimization; VLSI design; diffusion breaks; electrical characteristics; fully customer design; modified Euler path rule; optimal layout; parasitic capacitance; series-parallel graph; Boolean functions; Circuits; Displays; Electric variables; MOS devices; Mathematics; Minimization;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Circuits and Systems, 2004. Proceedings. The 2004 IEEE Asia-Pacific Conference on
Conference_Location :
Tainan
Print_ISBN :
0-7803-8660-4
Type :
conf
DOI :
10.1109/APCCAS.2004.1412818
Filename :
1412818
Link To Document :
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