Title :
A manufacturing driven `real-time statistical process control´ implementation model
Author_Institution :
IBM, Essex Junction, VT, USA
Abstract :
The philosophy of SPC (statistical process control) implementation embraced by the IBM, Essex Junction, photomask facility is highlighted. The philosophy, though progressive, complements the overall IBM goal of manufacturing workstation ownership. The following requirements of the model are discussed: SPC must be performed in real time; data must be plotted and analyzed by the manufacturing operator immediately upon availability; SPC must be owned and driven by the operators who use it, not by remote engineering groups; and the role of the operator must be redefined and upgraded to include aspects of data analysis via SPC techniques which have historically been reserved for engineers. It is noted that the above concepts have been implemented by IBM´s Essex Junction photomask facility with great success. All operators received a minimum of 18 hours of SPC training. The training was enthusiastically received; 92% of all operators rated the course as excellent. More than 500 statistically valid control charts now permeate the manufacturing line and are being used by the machine operators with excellent results. Examples of yield savings and other quality improvements achieved through increased tool and process control are presented
Keywords :
integrated circuit manufacture; management; photolithography; statistical process control; Essex Junction; IBM; SPC; implementation model; machine operator owned SPC; manufacturing driven SPC; manufacturing line; manufacturing workstation ownership; photomask facility; quality improvements; real-time statistical process control; statistically valid control charts; training; yield savings; Automotive engineering; Control engineering education; Data analysis; Maintenance engineering; Manufacturing processes; Process control; Software maintenance; Software performance; Virtual manufacturing; Workstations;
Conference_Titel :
Semiconductor Manufacturing Science Symposium, 1989. ISMSS 1989., IEEE/SEMI International
Conference_Location :
Burlingame, CA
DOI :
10.1109/ISMSS.1989.77241