Title :
New simulation methods for MOS VLSI timing and reliability
Author :
Shih, Y.-H. ; Leblebici, Y. ; Kang, S.M.
Author_Institution :
Coordinated Sci. Lab., Illinois Univ., Urbana, IL, USA
Abstract :
A novel approach to incorporating the channel length modulation in a direct-equation solving fast timing simulator is presented along with a mixed event-driven and waveform relaxation algorithm to handle MOS VLSI circuits with feedback. Simulation speedup of 3N over SPICE-like simulators has been observed, where N is the number of transistors. The simulator is able to simulate circuits as large as 235000 transistors in 10 min real time. Also presented is a novel approach to fast hot-carrier reliability simulation. These methods make it possible to achieve accurate and fast hot-carrier reliability simulation of MOS circuits each with as many as hundreds of thousands of MOS transistors in a workstation environment.<>
Keywords :
MOS integrated circuits; VLSI; circuit analysis computing; reliability; MOS VLSI circuits; MOS circuits; channel length modulation; direct-equation solving; fast hot-carrier reliability simulation; mixed event-driven; timing simulator; waveform relaxation algorithm; Circuit simulation; Computational modeling; Degradation; Differential equations; Hot carrier effects; Hot carriers; MOSFETs; Nonlinear equations; Timing; Very large scale integration;
Conference_Titel :
Computer-Aided Design, 1991. ICCAD-91. Digest of Technical Papers., 1991 IEEE International Conference on
Conference_Location :
Santa Clara, CA, USA
Print_ISBN :
0-8186-2157-5
DOI :
10.1109/ICCAD.1991.185220