DocumentCode :
289252
Title :
Reactive absorption of NOx using discharge plasma
Author :
Mizuno, Akira ; Shimizu, Kazuo ; Matsuoka, Tsutomu ; Furuta, Satoshi
Author_Institution :
Dept. of Ecological Eng., Toyohashi Univ. of Technol., Japan
fYear :
1994
fDate :
2-6 Oct 1994
Firstpage :
1550
Abstract :
Laboratory experiments on NOx removal were carried out using a plasma chemical process. In order to improve the NOx removal efficiency, several different wet-type plasma reactors were designed and tested using simulated gas. A dry-type reactor was also tested. Basically the reactors consist of a discharge electrode and a glass insulating tube surrounded by a ground electrode. The injection of ammonia and water vapor together enhanced the DeNOx performance of the dry-reactor. The wet-type reactors performed better compared with the dry reactor. In the wet-type reactors, the DeNOx performances using water, ammonia solution and NaOH solution as the absorbent, were about the same. When water was used, the DeNOx performance of the wet-type reactors stayed constant, even when the pH value of the water dropped to less than 3. The experimental results suggested that about half of the NO removed by the plasma process dissociated to N2 and O2 and that the other half became NO2 and was absorbed in water
Keywords :
absorption; air pollution control; ammonia; discharges (electric); dissociation; electrodes; nitrogen compounds; plasma devices; DeNOx performance; N2; NO; NOx removal; NaOH; NaOH solution; O2; absorbent; ammonia; ammonia solution; discharge electrode; discharge plasma; dissociation; dry-type plasma reactor; glass insulating tube; ground electrode; plasma chemical process; reactive absorption; removal efficiency; water vapor; wet-type plasma reactor; Absorption; Chemical processes; Electrodes; Glass; Inductors; Insulation; Laboratories; Plasma chemistry; Plasma simulation; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Industry Applications Society Annual Meeting, 1994., Conference Record of the 1994 IEEE
Conference_Location :
Denver, CO
Print_ISBN :
0-7803-1993-1
Type :
conf
DOI :
10.1109/IAS.1994.377633
Filename :
377633
Link To Document :
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