• DocumentCode
    2899557
  • Title

    EEPROM-based Charging-Effects Sensors for Plasma Etching and Ion Implantation

  • Author

    Lutkaszek, W.

  • Author_Institution
    Center for Integrated Systems, Stanford University
  • fYear
    1992
  • fDate
    25-28 Oct. 1992
  • Firstpage
    101
  • Lastpage
    105
  • Keywords
    EPROM; Etching; Implants; Ion implantation; Monitoring; Plasma applications; Plasma devices; Plasma immersion ion implantation; Plasma measurements; Sensor phenomena and characterization;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Wafer Level Reliability Workshop, 1992. Final Report., 1992 International
  • Conference_Location
    Lake Tahoe, CA, USA
  • Type

    conf

  • DOI
    10.1109/IWLR.1992.657991
  • Filename
    657991
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2899557