Title :
Extracting contact misalignment from 4- and 6-terminal contact resistors
Author :
Lieneweg, Udo ; Sayah, Hoshyar R.
Author_Institution :
Jet Propulsion Lab., California Inst. of Technol., Pasadena, CA, USA
Abstract :
A heuristic model is derived from simulations describing quantitatively the effect of contact misalignment on four- and six-terminal contact resistance measurements with L-type test structures. The four-terminal resistor pair allows only the extraction of the sum of the misalignment components and the extraction of the average interfacial resistance of the two contacts while a quantitative evaluation is restricted to such small misalignments that the second-order effect can be neglected. The six-terminal contact resistor allows the separation of the misalignment components and the determination of a single interfacial resistance while the magnitude of the misalignment can extend into the validity range of the second-order model
Keywords :
contact resistance; integrated circuit testing; metallisation; L-type test structures; average interfacial resistance; contact misalignment; contact resistance measurements; contact resistors; heuristic model; misalignment components; second-order model; validity range; Contact resistance; Electrical resistance measurement; Flanges; Geometry; Laboratories; Propulsion; Resistors; Semiconductor device measurement; Testing; Voltage;
Conference_Titel :
Microelectronic Test Structures, 1992. ICMTS 1992. Proceedings of the 1992 International Conference on
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-0535-3
DOI :
10.1109/ICMTS.1992.185967