DocumentCode
2899880
Title
Design and microfabrication of 220GHz clinotron HF structure
Author
Li, Hanyan ; Ren, Dapeng ; Feng, Jinjun
Author_Institution
Nat. Key Lab. of Sci. & Technol. on Vacuum Electron., Beijing Vacuum Electron. Res. Inst., Beijing, China
fYear
2012
fDate
24-26 April 2012
Firstpage
397
Lastpage
398
Abstract
The design and simulation of 220GHz clinotron HF structure have been carried several years ago[1]. This paper describes the status of the project, and the progress of manufacture and assembly.
Keywords
backward wave oscillators; microfabrication; millimetre wave oscillators; millimetre wave tubes; assembly progress; backward-wave oscillator; clinotron HF structure; frequency 220 GHz; manufacture progress; microfabrication; Blades; Etching; Gratings; Hafnium; Silicon; Solid modeling; Vacuum technology; Clinotron; Terahertz; deep reactive ion etching (DRIE); icrofabrication;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics Conference (IVEC), 2012 IEEE Thirteenth International
Conference_Location
Monterey, CA
Print_ISBN
978-1-4673-0188-6
Electronic_ISBN
978-1-4673-0187-9
Type
conf
DOI
10.1109/IVEC.2012.6262210
Filename
6262210
Link To Document