DocumentCode :
2899904
Title :
Non-fundamental low frequency noise theory: Drain noise-current modeling of AlGaN/GaN HFETs
Author :
Manouchehri, F. ; Valizadeh, P. ; Kabir, M.Z.
Author_Institution :
Dept. of Electr. & Comput. Eng., Concordia Univ., Montreal, QC, Canada
fYear :
2011
fDate :
12-16 June 2011
Firstpage :
220
Lastpage :
222
Abstract :
This work presents a theoretical study on the 1/f low frequency noise (LFN) based on the fluctuations in the number of carriers in the two-dimensional electron gas (2DEG) channel of AlGaN/GaN self-aligned HFETs. This study validates the role of thermally activated trap levels on 1/f LFN characteristics. Simulation results confirm that the low frequency noise behavior follows characteristic of 1/fγ with frequency exponent β between 0 and 2. At room temperature the simulation results are compared with the experiments. The effect of temperature is also studied on the noise behavior. It is found that the frequency exponent can vary with temperature.
Keywords :
1/f noise; III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device models; wide band gap semiconductors; 1-f low frequency noise; AlGaN-GaN; HFET; drain noise-current modeling; frequency exponent; temperature 293 K to 298 K; thermally activated trap levels; two-dimensional electron gas channel; Aluminum gallium nitride; Fluctuations; Gallium nitride; HEMTs; Low-frequency noise; MODFETs; 1/ƒ noise; AlGaN/GaN; HFET; low frequency noise;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Noise and Fluctuations (ICNF), 2011 21st International Conference on
Conference_Location :
Toronto, ON
Print_ISBN :
978-1-4577-0189-4
Type :
conf
DOI :
10.1109/ICNF.2011.5994305
Filename :
5994305
Link To Document :
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