DocumentCode :
2900033
Title :
Low-frequency noise in graphene field-effect transistors
Author :
Rumyantsev, S. ; Liu, G. ; Stillman, W. ; Kachorovskii, V. Yu ; Shur, M.S. ; Balandin, A.A.
Author_Institution :
Rensselaer Polytech. Inst., Troy, NY, USA
fYear :
2011
fDate :
12-16 June 2011
Firstpage :
234
Lastpage :
237
Abstract :
The low frequency noise has been studied in mechanically exfoliated single- and bilayer graphene deposited on Si/SiO2 substrates. Measurements were performed in 2- and 4-probe configuration schemes. The analysis of the gate voltage dependences of noise showed that noise in graphene transistors does not comply with the McWhorter model. Aging of graphene transistors due to exposure to ambient resulted in increased noise attributed to the decreasing mobility of graphene and increasing contact resistance. The model linking noise in graphene to the mobility fluctuations is discussed.
Keywords :
1/f noise; contact resistance; field effect transistors; graphene; probes; semiconductor device noise; C; McWhorter model; Si-SiO2; bilayer graphene; contact resistance; field-effect transistor; gate voltage; low-frequency noise; probe configuration scheme; single-graphene; Aging; Contact resistance; Fluctuations; Logic gates; Noise; Silicon; Transistors; degradation; graphene; hysteresis; noise;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Noise and Fluctuations (ICNF), 2011 21st International Conference on
Conference_Location :
Toronto, ON
Print_ISBN :
978-1-4577-0189-4
Type :
conf
DOI :
10.1109/ICNF.2011.5994311
Filename :
5994311
Link To Document :
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