Title :
Application of CMOS-Compatible Micro-Hotplates for In-situ Process Monitors
Author :
Suehle, John S. ; Gaitan, Michael
Author_Institution :
National Institute of Standards and Technology
Keywords :
Aluminum; Conductivity; Contacts; Etching; Fabrication; NIST; Silicon; Substrates; Temperature sensors; Testing;
Conference_Titel :
Wafer Level Reliability Workshop, 1992. Final Report., 1992 International
Conference_Location :
Lake Tahoe, CA, USA
DOI :
10.1109/IWLR.1992.657994
