DocumentCode
2900292
Title
Enhancement of extreme ultraviolet emission from a laser-produced-lithium plasma by use of dual laser pulses
Author
Higashiguchi, Takeshi ; Rajyaguru, Chirag ; Koga, Masato ; Kawasaki, Keita ; Sasaki, Wataru ; Kubodera, Shoichi
Author_Institution
Dept. of Electr. & Electron. Eng., Miyazaki Univ., Japan
fYear
2005
fDate
12-17 June 2005
Firstpage
431
Abstract
The use of dual laser pulses, a lithium plasma source produces unambiguously defined line emission at 13.5 nm with almost no off-band components, which minimize unnecessary heating of EUV optics. A plasma hydrodynamic calculation evaluated the plasma expansion time of 80 ns, within which the plasma density decreased to the critical density of the 1064-nm laser pulse.
Keywords
high-speed optical techniques; lithium; plasma density; plasma production by laser; plasma sources; ultraviolet sources; 1064 nm; 13.5 nm; 80 ns; EUV optics heating; Li; dual laser pulse; extreme ultraviolet emission; laser-produced-lithium plasma source; plasma density; plasma expansion; plasma hydrodynamic calculation; Delay effects; Hydrodynamics; Laser fusion; Laser theory; Optical pulses; Plasma density; Plasma measurements; Plasma sources; Plasma temperature; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Europe, 2005. CLEO/Europe. 2005 Conference on
Print_ISBN
0-7803-8974-3
Type
conf
DOI
10.1109/CLEOE.2005.1568209
Filename
1568209
Link To Document