DocumentCode :
2900379
Title :
Low-field I-V Method For Improved Dielectric Reliability
Author :
Klema, Jon E.
Author_Institution :
Motorola Incorporated
fYear :
1992
fDate :
25-28 Oct. 1992
Firstpage :
133
Lastpage :
136
Keywords :
BiCMOS integrated circuits; Circuit stability; Dielectric breakdown; Electric breakdown; Electrodes; Manufacturing; Monitoring; Production; Testing; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Wafer Level Reliability Workshop, 1992. Final Report., 1992 International
Conference_Location :
Lake Tahoe, CA, USA
Type :
conf
DOI :
10.1109/IWLR.1992.657995
Filename :
657995
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2900379
