Title :
Study of the atomic and molecular radiation in shadow mask PDP
Author :
Tu, Yan ; Yang, Lanlan ; Zhang, Xiong ; Wang, Baoping ; Yin, Hanchun ; Tong, Linsu
Author_Institution :
Dept. of Electron. Eng., Southeast Univ., Nanjing, China
Abstract :
The discharge process in a discharge cell of shadow mask plasma display panel (SM-PDP) has been calculated by means of fluid model. The relation between content of xenon in Ne-Xe mixture gas, pressure and efficiency has been investigated for SM-PDP. Simulation results show that the resonance xenon responsible for 147nm UV decreases with the increasing of the content of xenon and pressure, while the molecular xenon, radiating 173nm UV, increases. The efficacy of SM-PDP could be enhanced further if the phosphor is selected carefully considering of this conclusion.
Keywords :
flat panel displays; masks; neon; plasma displays; xenon; 147 nm; 173 nm; Ne; UV; Xe; atomic radiation; discharge process; fluid model; molecular radiation; phosphor; shadow mask PDP; shadow mask plasma display panel; Atomic measurements; Brightness; Costs; Electronic mail; Equations; Metastasis; Phosphors; Plasma displays; Resonance; Xenon;
Conference_Titel :
Vacuum Electron Sources Conference, 2004. Proceedings. IVESC 2004. The 5th International
Print_ISBN :
0-7803-8437-7
DOI :
10.1109/IVESC.2004.1414188
