DocumentCode :
2900756
Title :
The Forecast Of The Gate Oxide Reliability On The Wafer Level
Author :
Lisenker, B.
Author_Institution :
National Semiconductor
fYear :
1992
fDate :
25-28 Oct. 1992
Firstpage :
142
Lastpage :
145
Keywords :
Art; Circuit testing; Life estimation; MOS devices; Petroleum; Semiconductor device reliability; Shape; Switches; Thermal stresses; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Wafer Level Reliability Workshop, 1992. Final Report., 1992 International
Conference_Location :
Lake Tahoe, CA, USA
Type :
conf
DOI :
10.1109/IWLR.1992.657997
Filename :
657997
Link To Document :
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