DocumentCode :
2901161
Title :
Plasma polymers prepared by rf sputtering
Author :
Biederman, H.
Author_Institution :
Fac. of Math. & Phys., Charles Univ., Prague, Czech Republic
fYear :
1999
fDate :
1999
Firstpage :
42552
Lastpage :
42555
Abstract :
The deposition of plasma polymers using radiofrequency sputtering of polymer targets is promising especially in case of fluorocarbon films for various applications. Gaseous organic fragments as precursors for the plasma polymerization process are emitted and fragmented from the conventional polymer target. No gaseous or liquid precursors are needed
Keywords :
polymer films; deposition; fluorocarbon films; gaseous organic fragments; plasma polymerization process; plasma polymers; polymer targets; precursors; radiofrequency sputtering;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Plasma Polymerisation - Processing for the Future (Ref. No. 1999/026), IEE Seminar on
Conference_Location :
London
Type :
conf
DOI :
10.1049/ic:19990163
Filename :
773156
Link To Document :
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