DocumentCode :
2901174
Title :
Influence of polishing of stainless steel substrates on field emission properties of carbon nanotubes films
Author :
Fan, Zhiqin ; Lu, Zhanling ; Yang, Shi´e ; Yao, Ning ; Cheng, Lianqing ; Zhang, Binlin
Author_Institution :
Dept. of Math. & Phys., Zhengzhou Inst. of Technol., China
fYear :
2004
fDate :
6-10 Sept. 2004
Firstpage :
240
Lastpage :
241
Abstract :
Carbon nanotubes (CNTs) were synthesized from methane and hydrogen gas mixture directly on stainless steel plates by microwave plasma chemical vapor deposition (MPCVD). By pretreatment of the substrates such as mechanically polishing, we found the polishing can lower the turn-on field and improve the emission current density. The current density of the un-pretreated sample attains 2.9mA/cm2, but the polished sample attains 5.5 mA/cm2, at the electric field of 7.5 V/μm.
Keywords :
carbon nanotubes; chemical mechanical polishing; current density; field emission; plasma CVD; stainless steel; carbon nanotubes films; emission current density; field emission properties; mechanical polishing; microwave plasma chemical vapor deposition; stainless steel plates; stainless steel substrates; substrate pretreatment; Carbon nanotubes; Cathodes; Chemical technology; Current density; Electron emission; Hydrogen; Microwave technology; Plasma density; Steel; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Electron Sources Conference, 2004. Proceedings. IVESC 2004. The 5th International
Print_ISBN :
0-7803-8437-7
Type :
conf
DOI :
10.1109/IVESC.2004.1414216
Filename :
1414216
Link To Document :
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