Title :
A new filtering method to extract repeated defects (FIMER) [lithography]
Author :
Imai, Kiyotaka ; Kaga, Toru
Author_Institution :
Yield Manage. Consulting, KLA-Tencor Japan Ltd., Yokohama, Japan
Abstract :
With the increase in importance of lithography processes in the sub-0.25 μm era, it is becoming critical to extract repeated defects resulting from mask-related defects or from the lithography margin. In this paper, a new filtering method to extract repeated defects (FIMER) is proposed. It is shown by simulation that FIMER is superior to the conventional windowing method in extracting the repeated defects. For the simulation studies taken up in this paper, the repeated defects are extracted by FIMER with error of less than 5%
Keywords :
fault location; inspection; integrated circuit measurement; integrated circuit yield; lithography; masks; semiconductor process modelling; FIMER filtering method; filtering method to extract repeated defects; lithography; lithography margin; lithography processes; mask-related defect; repeated defect extraction; repeated defect extraction error; repeated defects; simulation; windowing method; Context modeling; Data mining; Electronic mail; Filtering; Lithography; Probes; Semiconductor device modeling; Testing;
Conference_Titel :
Statistical Metrology, 1999. IWSM. 1999 4th International Workshop on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-5154-1
DOI :
10.1109/IWSTM.1999.773187
