Title :
Implementation of a TCAD based system to aid process transfer
Author :
Nilsen, Vidar K. ; Walton, Anthony J. ; Donnelly, Jacqueline ; Horsburgh, G. ; Childs, Russell
Author_Institution :
Dept. of Electron. & Electr. Eng., Edinburgh Univ., UK
Abstract :
This paper describes a methodology for using TCAD as an aid to process transfer. The methodology is based on the use of a semi-automated system developed to reduce the effort required by the user in developing the TCAD code, thereby reducing the time taken to implement a process transfer. The issues involved in process transfer are considered, as is the role that TCAD can play in the procedure. The operation of the system is outlined and an example of its application is used to indicate its potential
Keywords :
integrated circuit manufacture; semiconductor process modelling; technology CAD (electronics); TCAD; TCAD based system implementation; TCAD code development; TCAD methodology; process transfer; process transfer implementation time; semi-automated system; system operation; Application software; Consumer electronics; Doping profiles; Furnaces; Investments; Mass spectroscopy; National electric code; Semiconductor process modeling; Temperature; Thermal resistance;
Conference_Titel :
Statistical Metrology, 1999. IWSM. 1999 4th International Workshop on
Conference_Location :
Kyoto
Print_ISBN :
0-7803-5154-1
DOI :
10.1109/IWSTM.1999.773195
