DocumentCode :
2901931
Title :
Effect of oxide thickness scaling on self-heating in graphene transistors
Author :
Islam, Sharnali ; Bae, Myung-Ho ; Dorgan, Vincent ; Pop, Eric
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Illinois, Urbana, IL, USA
fYear :
2011
fDate :
20-22 June 2011
Firstpage :
41
Lastpage :
42
Abstract :
To summarize, we have studied the effects of self-heating on graphene-on-insulator transistors. Physically, we find that ambipolar and unipolar operation lead to different scaling of peak channel temperature. For realistic devices, although the current degradation can be kept <;10% by careful choice of oxide thickness (~80 nm), sharply peaked temperatures can nevertheless have an impact on long-term device reliability and must be carefully considered in future device designs.
Keywords :
graphene; semiconductor device reliability; transistors; ambipolar operation; graphene-on-insulator transistor; long-term device reliability; oxide thickness scaling; peak channel temperature; self-heating; unipolar operation; Irrigation; Reliability; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference (DRC), 2011 69th Annual
Conference_Location :
Santa Barbara, CA
ISSN :
1548-3770
Print_ISBN :
978-1-61284-243-1
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2011.5994412
Filename :
5994412
Link To Document :
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