DocumentCode
2902024
Title
Giant magnetoelectric effect in nanofabricated Pb(Zr0.52 Ti0.48 )O3 -Fe85 B5 Si10 cantilevers and resonant gate transistors
Author
Li, Feng ; Fang, Zhao ; Misra, Rajiv ; Tadigadapa, Srinivas ; Zhang, Qiming ; Datta, Suman
Author_Institution
Electr. Eng., Pennsylvania State Univ., University Park, PA, USA
fYear
2011
fDate
20-22 June 2011
Firstpage
69
Lastpage
70
Abstract
Magnetoelectric (ME) laminates show higher ME coefficients than that of natural multiferroics (e.g. Cr2O3, BiTiO) by up to several orders of magnitude. Recent studies on bulk ME sensors using Fe85B5Si10 (Metglas) /polyvinylidene fluoride composite show a high ME voltage coefficient of 21V/cm·Oe at 20 Hz. However, bulk sensors suffer from poor epoxy bonding, aging and difficulty of integration with CMOS electronics. Here, we report, for the first time, the monolithic nanofabrication of Pb(Zr0.52Ti0.48)O3 (PZT)-Fe85B5Si10 ME cantilevers (Fig.1(a)) on silicon substrate which achieve 0.46 V/cm·Oe at 20 Hz and 1.8 V/cm·Oe at a resonance frequency of 8.4 KHz. Also, ME cantilever based resonant gate transistors (RGT) (Fig.1 (b)) has been designed and analyzed in comparison with ME cantilever. A 10X signal to noise ratio improvement can be reached by ME RGT. This shows the compatibility of the nanofabricated cantilever ME sensors with the Si process technology and paves the way for the future integration of MEMS based ultra-sensitive magnetic sensors with advanced Si nanoelectronics.
Keywords
bonding processes; cantilevers; laminates; magnetoelectric effects; monolithic integrated circuits; nanoelectronics; nanofabrication; CMOS electronics; Fe85B5Si10; MEMS based ultra-sensitive magnetic sensors; Si; epoxy bonding; frequency 20 Hz; giant magnetoelectric effect; magnetoelectric laminates; monolithic nanofabrication; nanoelectronics; nanofabricated cantilever magnetoelectric sensors; natural multiferroics; polyvinylidene fluoride composite; resonant gate transistors; signal to noise ratio; Annealing; Magnetic fields; Magnetic resonance; Signal to noise ratio;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference (DRC), 2011 69th Annual
Conference_Location
Santa Barbara, CA
ISSN
1548-3770
Print_ISBN
978-1-61284-243-1
Electronic_ISBN
1548-3770
Type
conf
DOI
10.1109/DRC.2011.5994416
Filename
5994416
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