Vertical organic field-effect transistor array fabrication based on laser holography lithography process

We have made a VOFET array on a ITO sputtered quartz substrate using a laser holography lithography technique during lateral patterning of VOFET structures. Holographically generated higher-order nanoscale patterns were uniform in size, location and shape, hence more accurate device analysis would be possible through VOFETs patterned with a laser holography lithography process. We believe that this simple and cost-competitive patterning technique which enables uniform nanoscale patterning for a large area, would improve the process reliability of VOFETs, in addition to device performances of VOFETs.