DocumentCode :
2902718
Title :
High-mobility organic thin-film transistors with photolithographically patterned top contacts
Author :
Zschieschang, Ute ; Hansen, Nis Hauke ; Pflaum, Jens ; Yamamoto, Tatsuya ; Takimiya, Kazuo ; Kuwabara, Hirokazu ; Ikeda, Masaaki ; Sekitani, Tsuyoshi ; Someya, Takao ; Klauk, Hagen
Author_Institution :
Max Planck Inst. for Solid State Res., Stuttgart, Germany
fYear :
2011
fDate :
20-22 June 2011
Firstpage :
57
Lastpage :
58
Abstract :
Due to its large-area capability and high resolution, photolithography is the preferred patterning method for pentacene thin-film transistors (TFTs) for display and circuit applications [1,2]. Since the morphology of thin pentacene films is very sensitive to solvents and heat [3,4], the photolithographic patterning of the source/drain contacts is ideally performed prior to the pentacene deposition, which explains the general preference for the bottom-contact (coplanar) TFT structure. However, as experiments [5] and simulations [6,7] have shown, the bottom-contact TFT structure is associated with substantially larger contact resistance than the top-contact (staggered) structure, which means that for the same channel length, top-contact TFTs are expected to provide larger transconductance and higher cutoff frequency than bottom-contact TFTs. Here we report on organic TFTs with Au top contacts patterned by ordinary photolithography and wet etching (using common solvents, photoresists, and etchants) having field-effect mobilities (0.4 cm2/Vs) and on/off current ratios (107) similar to those of optimized bottom-contact pentacene TFTs [1,2,5].
Keywords :
etching; organic semiconductors; photolithography; thin film transistors; channel length; high-mobility organic thin-film transistors; patterned top contacts; photolithography; thin pentacene films; wet etching; Gold; Lithography; Logic gates; Pentacene;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference (DRC), 2011 69th Annual
Conference_Location :
Santa Barbara, CA
ISSN :
1548-3770
Print_ISBN :
978-1-61284-243-1
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2011.5994449
Filename :
5994449
Link To Document :
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