• DocumentCode
    2902718
  • Title

    High-mobility organic thin-film transistors with photolithographically patterned top contacts

  • Author

    Zschieschang, Ute ; Hansen, Nis Hauke ; Pflaum, Jens ; Yamamoto, Tatsuya ; Takimiya, Kazuo ; Kuwabara, Hirokazu ; Ikeda, Masaaki ; Sekitani, Tsuyoshi ; Someya, Takao ; Klauk, Hagen

  • Author_Institution
    Max Planck Inst. for Solid State Res., Stuttgart, Germany
  • fYear
    2011
  • fDate
    20-22 June 2011
  • Firstpage
    57
  • Lastpage
    58
  • Abstract
    Due to its large-area capability and high resolution, photolithography is the preferred patterning method for pentacene thin-film transistors (TFTs) for display and circuit applications [1,2]. Since the morphology of thin pentacene films is very sensitive to solvents and heat [3,4], the photolithographic patterning of the source/drain contacts is ideally performed prior to the pentacene deposition, which explains the general preference for the bottom-contact (coplanar) TFT structure. However, as experiments [5] and simulations [6,7] have shown, the bottom-contact TFT structure is associated with substantially larger contact resistance than the top-contact (staggered) structure, which means that for the same channel length, top-contact TFTs are expected to provide larger transconductance and higher cutoff frequency than bottom-contact TFTs. Here we report on organic TFTs with Au top contacts patterned by ordinary photolithography and wet etching (using common solvents, photoresists, and etchants) having field-effect mobilities (0.4 cm2/Vs) and on/off current ratios (107) similar to those of optimized bottom-contact pentacene TFTs [1,2,5].
  • Keywords
    etching; organic semiconductors; photolithography; thin film transistors; channel length; high-mobility organic thin-film transistors; patterned top contacts; photolithography; thin pentacene films; wet etching; Gold; Lithography; Logic gates; Pentacene;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2011 69th Annual
  • Conference_Location
    Santa Barbara, CA
  • ISSN
    1548-3770
  • Print_ISBN
    978-1-61284-243-1
  • Electronic_ISBN
    1548-3770
  • Type

    conf

  • DOI
    10.1109/DRC.2011.5994449
  • Filename
    5994449