DocumentCode
2903474
Title
Microfabrication of W-band folded waveguide slow wave structure using DRIE and UV-LIGA technology
Author
Li, Hanyan ; Feng, Jinjun ; Bai, Guodong
Author_Institution
Vacuum Electron. Nat. Lab., Beijing Vacuum Electron. Res. Inst., Beijing, China
fYear
2011
fDate
21-24 Feb. 2011
Firstpage
379
Lastpage
380
Abstract
The recent progress of manufacturing folded waveguide slow wave structures using deep reactive ion etching (DRIE) technology and UV-LIGA, and the main fabrication process are briefly presented with an emphasis on fabrication of the prototypical W band serpentine trench. With the optimal fabrication parameters, the W band folded waveguide slow wave structure with the beam tunnel is fabricated. In this paper, we also report a two-step UV-LIGA to fabricate the W band serpentine trench.
Keywords
LIGA; microfabrication; slow wave structures; sputter etching; waveguides; DRIE technology; UV-LIGA Technology; W-band folded waveguide slow wave structure; beam tunnel; deep reactive ion etching technology; microfabrication; prototypical W band serpentine trench; Etching; Fabrication; Optical waveguides; Resists; Silicon; Vacuum technology; Microfabrication; UV-LIGA; deep reactive ion etching (DRIE); folded waveguide; optical lithography technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics Conference (IVEC), 2011 IEEE International
Conference_Location
Bangalore
Print_ISBN
978-1-4244-8662-5
Type
conf
DOI
10.1109/IVEC.2011.5747034
Filename
5747034
Link To Document