Title :
Variability in VLSI Circuits: Sources and Design Considerations
Author :
Abu-Rahma, Mohamed H. ; Anis, Mohab
Author_Institution :
Dept. of Electr. & Comput. Eng., Waterloo Univ., Ont.
Abstract :
Process variations are becoming of increasing importance in nanometer CMOS regime. This paper reviews the challenges associated with variability and variation-tolerant design in nanometer CMOS. It highlights how design decisions, circuit techniques, and architecture decisions are modified to address the difficulties posed by the large increase in process variations.
Keywords :
CMOS integrated circuits; integrated circuit design; nanoelectronics; VLSI circuits; architecture decisions; circuit techniques; design decisions; nanometer CMOS regime; process variations; variation-tolerant design; CMOS technology; Circuits; Design automation; Design engineering; Performance analysis; Propagation delay; Random variables; Timing; Tunneling; Very large scale integration;
Conference_Titel :
Circuits and Systems, 2007. ISCAS 2007. IEEE International Symposium on
Conference_Location :
New Orleans, LA
Print_ISBN :
1-4244-0920-9
Electronic_ISBN :
1-4244-0921-7
DOI :
10.1109/ISCAS.2007.378156
