DocumentCode :
2904075
Title :
Aluminum top-gate ZnO nanowire transistors with improved transconductance
Author :
Kälblein, Daniel ; Fenk, Bernhard ; Hahn, Kersten ; Zschieschang, Ute ; Kern, Klaus ; Klauk, Hagen
Author_Institution :
Max Planck Inst. for Solid State Res., Stuttgart, Germany
fYear :
2011
fDate :
20-22 June 2011
Firstpage :
249
Lastpage :
250
Abstract :
The authors shows that by replacing gold with aluminum for the top gate, the thickness of the gate dielectric increases by a few nanometers due to the spontaneous formation of an interfacial AlOx layer. As a result, the Al top-gate FETs operate with gate currents below 1 pA for voltages up to 3 V, making them fully compatible with organic LEDs. The ZnO nanowires were grown hydrothermally on a zinc foil. Transmission electron microscopy (TEM) confirms that the nanowires grow along the c-axis and are single-crystalline. The as-grown nanowires are degenerately doped and require a post-growth anneal (600°C) to make them suitable for FETs.
Keywords :
II-VI semiconductors; aluminium compounds; annealing; insulated gate field effect transistors; nanowires; transmission electron microscopy; zinc compounds; AlOx; ZnO; field effect transistor; gate dielectric; improved transconductance; nanowire transistor; organic LED; post growth annealing; single crystalline; top gate; transmission electron microscopy; FETs; Fabrication; Light emitting diodes; Logic gates; Substrates; Transconductance; Zinc oxide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference (DRC), 2011 69th Annual
Conference_Location :
Santa Barbara, CA
ISSN :
1548-3770
Print_ISBN :
978-1-61284-243-1
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2011.5994518
Filename :
5994518
Link To Document :
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