• DocumentCode
    2904339
  • Title

    Trap-related delay analysis of self-aligned N-polar GaN/InAlN HEMTs with record extrinsic gm of 1105 mS/mm

  • Author

    Nidhi ; Dasgupta, S. ; Lu, J. ; Wu, F. ; Keller, S. ; Speck, J.S. ; Mishra, U.K.

  • Author_Institution
    ECE Dept., Univ. of California Santa Barbara, Santa Barbara, CA, USA
  • fYear
    2011
  • fDate
    20-22 June 2011
  • Firstpage
    279
  • Lastpage
    280
  • Abstract
    Ga-polar InAlN-based charge-inducing barrier for HEMTs have been recently demonstrated as a viable technology for high frequency applications due to high polarization charge and hence, low resistance channels. In this paper, we report on MBE-grown N-polar GaN/InAlN HEMTs with excellent DC and RF performance. There exists a discrepancy in the DC and RF data for N-polar MBE InAlN devices which is explained through several measurements and analysis and possible solutions are discussed.
  • Keywords
    III-V semiconductors; gallium compounds; high electron mobility transistors; indium compounds; molecular beam epitaxial growth; Ga-polar InAlN-based charge-inducing barrier; GaN-InAlN; MBE-grown N-polar GaN/InAlN HEMT; selfaligned N-polar GaN/InAlN HEMT; trap-related delay analysis; Gallium nitride; Nickel;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2011 69th Annual
  • Conference_Location
    Santa Barbara, CA
  • ISSN
    1548-3770
  • Print_ISBN
    978-1-61284-243-1
  • Electronic_ISBN
    1548-3770
  • Type

    conf

  • DOI
    10.1109/DRC.2011.5994531
  • Filename
    5994531