DocumentCode
2904808
Title
Production Automation for GaAs MMICs
Author
Oakes, J.G. ; Wrick, V.L.
Author_Institution
Raytheon, SMDO, Northborough, MA 01532
Volume
3
fYear
1985
fDate
20-23 Oct. 1985
Firstpage
695
Lastpage
695
Abstract
The need for larger quantities of GaAs MMICs to support developmental and future production programs in radar and ECM systems has fostered the use of automated wafer fabrication and test equipment in the Pilot Production Line at Raytheon. The exclusive use of uniform, 3-inch diameter GaAs wafers has permitted the use of silicon processing equipment in the GaAs facility. Examples of improved process control and uniformity through automated equipment include the photolithography, cleaning, etching and testing areas. Increasing application of automated equipment in other labor-intensive portions of the MMIC process is inevitable.
Keywords
Automation; Electronic countermeasures; Fabrication; Gallium arsenide; MMICs; Process control; Production systems; Radar equipment; Silicon; Test equipment;
fLanguage
English
Publisher
ieee
Conference_Titel
Military Communications Conference, 1985. MILCOM 1985. IEEE
Conference_Location
Boston, MA, USA
Type
conf
DOI
10.1109/MILCOM.1985.4795125
Filename
4795125
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