DocumentCode
2905260
Title
Effect of Electromigration on Intermetallic Compound Formation in Sn-9Zn Solder Interconnect
Author
Zhang, X.F. ; Guo, J.D. ; Shang, J.K.
Author_Institution
Chinese Acad. of Sci., Shenyang
fYear
2007
fDate
14-17 Aug. 2007
Firstpage
1
Lastpage
4
Abstract
Interfacial reactions from high-density electric currents were investigated in a eutectic SnZn solder/Cu interconnect. An abnormal "polarity effect" was found where the intermetallic compound layer at the cathode was thicker than that at the anode. A kinetic model, based on the Zn mass transport in the sample, was presented to explain the growth of the intermetallic compound at the anode and cathode. The back stress induced by electromigration of Sn in the solder interconnect is considered to drive Zn atoms drift to cathode.
Keywords
copper; electromigration; eutectic alloys; solders; tin alloys; zinc alloys; SnZn-Cu; electromigration; eutectic solder interconnect; high-density electric currents; intermetallic compound formation; Anodes; Atomic measurements; Cathodes; Current; Electromigration; Intermetallic; Kinetic theory; Stress; Tin; Zinc;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Packaging Technology, 2007. ICEPT 2007. 8th International Conference on
Conference_Location
Shanghai
Print_ISBN
978-1-4244-1392-8
Electronic_ISBN
978-1-4244-1392-8
Type
conf
DOI
10.1109/ICEPT.2007.4441519
Filename
4441519
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