DocumentCode :
2905260
Title :
Effect of Electromigration on Intermetallic Compound Formation in Sn-9Zn Solder Interconnect
Author :
Zhang, X.F. ; Guo, J.D. ; Shang, J.K.
Author_Institution :
Chinese Acad. of Sci., Shenyang
fYear :
2007
fDate :
14-17 Aug. 2007
Firstpage :
1
Lastpage :
4
Abstract :
Interfacial reactions from high-density electric currents were investigated in a eutectic SnZn solder/Cu interconnect. An abnormal "polarity effect" was found where the intermetallic compound layer at the cathode was thicker than that at the anode. A kinetic model, based on the Zn mass transport in the sample, was presented to explain the growth of the intermetallic compound at the anode and cathode. The back stress induced by electromigration of Sn in the solder interconnect is considered to drive Zn atoms drift to cathode.
Keywords :
copper; electromigration; eutectic alloys; solders; tin alloys; zinc alloys; SnZn-Cu; electromigration; eutectic solder interconnect; high-density electric currents; intermetallic compound formation; Anodes; Atomic measurements; Cathodes; Current; Electromigration; Intermetallic; Kinetic theory; Stress; Tin; Zinc;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Packaging Technology, 2007. ICEPT 2007. 8th International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-1392-8
Electronic_ISBN :
978-1-4244-1392-8
Type :
conf
DOI :
10.1109/ICEPT.2007.4441519
Filename :
4441519
Link To Document :
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