• DocumentCode
    2905260
  • Title

    Effect of Electromigration on Intermetallic Compound Formation in Sn-9Zn Solder Interconnect

  • Author

    Zhang, X.F. ; Guo, J.D. ; Shang, J.K.

  • Author_Institution
    Chinese Acad. of Sci., Shenyang
  • fYear
    2007
  • fDate
    14-17 Aug. 2007
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Interfacial reactions from high-density electric currents were investigated in a eutectic SnZn solder/Cu interconnect. An abnormal "polarity effect" was found where the intermetallic compound layer at the cathode was thicker than that at the anode. A kinetic model, based on the Zn mass transport in the sample, was presented to explain the growth of the intermetallic compound at the anode and cathode. The back stress induced by electromigration of Sn in the solder interconnect is considered to drive Zn atoms drift to cathode.
  • Keywords
    copper; electromigration; eutectic alloys; solders; tin alloys; zinc alloys; SnZn-Cu; electromigration; eutectic solder interconnect; high-density electric currents; intermetallic compound formation; Anodes; Atomic measurements; Cathodes; Current; Electromigration; Intermetallic; Kinetic theory; Stress; Tin; Zinc;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Packaging Technology, 2007. ICEPT 2007. 8th International Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-1392-8
  • Electronic_ISBN
    978-1-4244-1392-8
  • Type

    conf

  • DOI
    10.1109/ICEPT.2007.4441519
  • Filename
    4441519